AMICUS / ESCA 3400

The AMICUS, also known as the ESCA 3400 in Japan, has been developed from proven technology and incorporates the latest in digital control electronics producing an easy to use, flexible system suitable for all levels of expertise.

Recognised as a compact, versatile x-ray photoelectron spectrometer the AMICUS is designed for a wide range of applications.

AMICUS XPS has been designed with a compact footprint enabling it to be used for a wide variety of applications ranging from routine laboratory use to quality control and assurance in production environments. The high performance of the AMICUS has been accomplished through the incorporation of the successful "Dupont" type analyser and optimised digital electronics.

A simple, rapid sample introduction system is integrated with a fully automated multi sample carousel system enabling a wide range of applications to be addressed, including high throughput completely unattended routine operation. The standardised, highly user friendly XPS acquisition and data processing software enables both simple and complex studies to be carried out in a totally automated fashion. The ability to set up and store previously defined data acquisition and processing parameters ensures that reproducible procedures are maintained, an important criterion in quality control environments.

AMICUS Carousel

A number of sample handling and sample preparation options are available for the AMICUS. To increase the speed of sample introduction a ten sample introduction chamber can replace the standard sample introduction probe. Up to ten samples may be mounted on a linear sample carrier and pumped in a single pump down sequence. After a suitable pump down duration the samples may be introduced into the analysis chamber and analysis commenced whilst the next set of samples are introduced to the 10 sample introduction chamber. Another option that replaces the standard insertion probe is the gas reaction cell which allows samples to be treated at high pressures and high temperatures. The gas reaction cell may be used with gases such as H2, O2, CH4  and NH3 for oxidation/reduction studies of samples with PID controlled heating up to 1000 ºC.

VACUUM SYSTEM

Sample analysis chamber (SAC)
150 l/s turbomolecular pump (base pressure 5x10-7Pa)

SAMPLE INTRODUCTION CHAMBER

50 l/s turbomolecular pump
10 sample introduction chamber (optional)

SYSTEM BAKING

integrated timer controlled heating tapes

SAMPLE HANDLING

10 sample carousel
fully software controlled

SAMPLE DIMENSIONS

≤10mm diameter
≤ 5mm thick

SAMPLE PREPARATION & HANDLING (OPTIONS)

Air sensitive transport device
High temperature gas reaction cell

X-RAY SOURCE

Dual Mg/Al anodes
conical formed magnesium target
300W max power 12kV 25mA

ELECTRON ENERGY ANALYSER

Low pass/high pass filter
selectable pass energy, 25, 75, and 150eV
single channeltron detector

ION ETCHING SYSTEM

Standard ion etching source

0.5, 1, 1.5, and 2kV accelerating voltage
Etch rate 5-100 Angstrom/min (material dependent)
sample rotation during etching

Kaufman high speed etching source (option)

0-1000V accelearting potential (continuously variable)
Etch rate 50-800 Angstrom/min (material dependent)

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